Difference between revisions of "Dual weapon mastery (talent)"

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Your offhand weapon damage penalty is reduced to {{ctl|0|40|20}}%. Up to {{css|Cun|2|3}} times a turn, you have a {{cl|(Talent Level * Dex)|90%|15|20|60%|250}} chance to parry up to (offhand weapon damage * {{ctl|1|.6|.8}}) damage from a melee or ranged attack. The number of parries increases with your Cunning. (A fractional parry has a reduced chance to succeed.)
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Your offhand weapon damage penalty is reduced to {{ctl|0%|40|20%}}. Up to {{css|Cun|2|3}} times a turn, you have a {{cl|(Talent Level * Dex)|90%|15|20|60%|250}} chance to parry up to (offhand weapon damage * {{ctl|1|.6|.8}}) damage from a melee or ranged attack. The number of parries increases with your Cunning. (A fractional parry has a reduced chance to succeed.)
 
A successful parry reduces damage like armor (before any attack multipliers) and prevents critical strikes. It is difficult to parry attacks from unseen attackers and you cannot parry with a mindstar.
 
A successful parry reduces damage like armor (before any attack multipliers) and prevents critical strikes. It is difficult to parry attacks from unseen attackers and you cannot parry with a mindstar.
 
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Latest revision as of 07:48, 7 April 2017

Dual Weapon Mastery
Dual weapon mastery.png
Game Version 1.5.2
Category Type Technique
Category Duelist
Requirements Lvl (0,1,2,3,4) Dex (12,14,16,18,20)
Use Mode Passive
Cost -
Range -
Cooldown -
Travel Speed -
Use Speed -
Description Your offhand weapon damage penalty is reduced to 40–20%cTL:0%. Up to 2–3cSS:Cun times a turn, you have a 15–60%cL:90% as (Talent Level * Dex) varies from 20–250 chance to parry up to (offhand weapon damage * .6–.8cTL:1) damage from a melee or ranged attack. The number of parries increases with your Cunning. (A fractional parry has a reduced chance to succeed.)

A successful parry reduces damage like armor (before any attack multipliers) and prevents critical strikes. It is difficult to parry attacks from unseen attackers and you cannot parry with a mindstar.